你即將離開本站

並前往https://patents.google.com/patent/WO1989010584A1/en

WO1989010584A1 - A method for making a reticle mask

A reticle mask (15) is made by the double pass method wherein scribe lines (14) are first drawn on the reticle mask (15). Thereafter, a product die pattern (32) ...

確定！ 回上一頁

查詢 「Reticle Mask」的人也找了：

  1. reticle mask差異
    2.
  2. reticle光罩
    3.
  3. Photomask
    4.
  4. Reticle
    5.
  5. 光罩製作流程
    6.
  6. 半導體光罩英文
    7.
  7. Reticle Handler
    8.
  8. reticle field layout中文
    9.