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並前往https://www.semanticscholar.org/paper/Fundamental-aspects-of-HfO2-based-high-k-metal-gate-Cartier-Kerber/deb8c7be639b779233bd796a0380f7882b374355

Fundamental aspects of HfO2-based high-k metal gate stack ...

Experimental reliability trends indicate that tinv-scaling with HKMG stacks remains challenging because NBTI, PBTI and TDDB reliability ...

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