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並前往https://www.x-mol.com/paper/1420106038273728512

提高28 nm 低功耗高k/金属栅极器件性能的门堆栈工程 - X-MOL

... a gate-stack engineering technique is proposed as a means of improving the performance of a 28 nm low-power (LP) high-k/metal-gate ...

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