你即將離開本站

並前往https://www.pfeiffer-vacuum.com/en/markets/semiconductor/ion-implantation/source-beamline-end-station/

Vacuum solutions for your ion implant applications!

Ion implantation process consists of wafer surface doping with ions such as Boron, Phosphorus and Arsenic, thus changing the electrical characteristics ...

確定！ 回上一頁

查詢 「Ion implant」的人也找了：

  1. Ion implantation vs diffusion
    2.
  2. What is ion implantation technology
    3.
  3. implanter原理
    4.
  4. implant半導體
    5.
  5. well implant目的
    6.
  6. Amat implanter
    7.
  7. Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators
    8.
  8. Implant Rp
    9.