你即將離開本站

並前往http://nnfc.cense.iisc.ac.in/equipment/icp-rie

ICP-RIE - National Nanofabrication Centre

Reactive Ion Etching (RIE) is an etching technology used in micro and nano fabrication wherein plasma is used to remove materials deposited on the substrate ...

確定！ 回上一頁

查詢 「ICP RIE vs RIE」的人也找了：

  1. icp rie原理
    2.
  2. ICP RIE
    3.
  3. Plasma etching comparing PE, RIE and ICP-RIE
    4.
  4. ICP vs CCP
    5.
  5. Reactive ion etching
    6.
  6. Oxford ICP
    7.
  7. Icp Wafer
    8.
  8. Samco ICP
    9.