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並前往https://www.eetasia.com/euv-lithography-scanner-aims-to-produce-104-wafers-h/

EUV lithography scanner aims to produce 104 wafers/h

The ASML NXE:3400B EUV lithography scanner runs at 148W to produce 104 wafers/h, capable of creating overlays within a 3nm tolerance.

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